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It is expected to be necessary for the 10 nm and 7 nm node. Opc can design for ideal process conditions. But unlike the earlier.
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SelfAligned Double Patterning—Part Deux
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Web abstract—double patterning technology (dpt) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of extreme ultra violet lithography. Web double patterning mitigates the impact of diffraction in optical lithography. Errors in dose, focus, or mask overlay will affect potential yield. Web double patterning is a widely used technique in advanced semiconductor manufacturing processes, especially at smaller process nodes.
There Are Three Main Double Pattern Techniques Are There.
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